JPH083004Y2 - 熱処理炉 - Google Patents
熱処理炉Info
- Publication number
- JPH083004Y2 JPH083004Y2 JP1987185087U JP18508787U JPH083004Y2 JP H083004 Y2 JPH083004 Y2 JP H083004Y2 JP 1987185087 U JP1987185087 U JP 1987185087U JP 18508787 U JP18508787 U JP 18508787U JP H083004 Y2 JPH083004 Y2 JP H083004Y2
- Authority
- JP
- Japan
- Prior art keywords
- buffer
- gas
- reaction tube
- wafer
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 title claims description 8
- 239000000872 buffer Substances 0.000 claims description 45
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 57
- 235000012431 wafers Nutrition 0.000 description 27
- 230000000630 rising effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987185087U JPH083004Y2 (ja) | 1987-12-04 | 1987-12-04 | 熱処理炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987185087U JPH083004Y2 (ja) | 1987-12-04 | 1987-12-04 | 熱処理炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0189738U JPH0189738U (en]) | 1989-06-13 |
| JPH083004Y2 true JPH083004Y2 (ja) | 1996-01-29 |
Family
ID=31699772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987185087U Expired - Lifetime JPH083004Y2 (ja) | 1987-12-04 | 1987-12-04 | 熱処理炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH083004Y2 (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6320325B2 (ja) * | 2015-03-05 | 2018-05-09 | 三菱電機株式会社 | 半導体製造装置および半導体デバイスの製造方法 |
| FR3101196B1 (fr) * | 2019-09-20 | 2021-10-01 | Semco Smartech France | Dispositif d'homogeneisation |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159252A (en]) * | 1974-06-12 | 1975-12-23 | ||
| JPS58130538A (ja) * | 1982-01-28 | 1983-08-04 | Matsushita Electric Works Ltd | 酸化炉 |
| JPS61166023A (ja) * | 1985-01-17 | 1986-07-26 | Matsushita Electronics Corp | 半導体ウエハの熱処理方法 |
-
1987
- 1987-12-04 JP JP1987185087U patent/JPH083004Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0189738U (en]) | 1989-06-13 |
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